Submicrometer-thick low-loss AS2S3 planar waveguides for nonlinear optical devices

IEEE Photonics Technology Letters

Volumn 22, Issue 7, 2010, Pages 495-497

  Choi, D Y ^a   Madden, S ^a   Bulla, D A ^a   Wang, R ^a   Rode, A ^a   Luther Davies, B ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Amorphous semiconductors; Fabrication; Nonlinear optic devices; Optical waveguides

Indexed keywords

ALKALINE DEVELOPER; BOTTOM ANTIREFLECTIVE COATING; ETCHED SIDEWALLS; FABRICATION PROCESS; LOW LOSS; NONLINEAR OPTICAL DEVICES; PHOTORESIST PATTERNING; PROPAGATION LOSS; PROTECTIVE LAYERS; SUBMICROMETERS; SURFACE SCATTERING; TRANSVERSE-MAGNETIC MODE;

AMORPHOUS SEMICONDUCTORS; FABRICATION; OPTICAL INSTRUMENTS; OPTICAL MATERIALS; OPTICAL WAVEGUIDES; PHOTOREACTIVITY; THICK FILMS; WAVEGUIDES;

ELECTRIC LOSSES;

EID: 77955216176     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2010.2040170     Document Type: Article

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