Optical materials for immersion lithography

Journal of Photopolymer Science and Technology

Volumn 18, Issue 5, 2005, Pages 655-662

  Burnett, John H ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

High index materials; Hyper NA; Immersion lithography; Oxides

Indexed keywords

EID: 22244477419     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.655     Document Type: Article

References (15)

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