Microphotonic parabolic light directors fabricated by two-photon lithography

Applied Physics Letters

Volumn 99, Issue 15, 2011, Pages

  Atwater, J H ^a   Spinelli, P ^a   Kosten, E ^b   Parsons, J ^a   Van Lare, C ^a   Van De Groep, J ^a   Garcia De Abajo, J ^c   Polman, A ^a   Atwater, H A ^b  

^a FOM INSTITUTE AMOLF   (Netherlands)

^b California Institute of Technology   (United States)

^c INSTITUTO DE ÓPTICA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM DIRECTIVITY; BEAM DIVERGENCE; COLLIMATED BEAMS; ELECTROMAGNETIC SIMULATION; FULL-FIELD; OPTICAL TRANSMISSION MEASUREMENTS; THIN-FILM PROCESSING; TWO-PHOTON LITHOGRAPHY;

DESIGN; ION BEAM LITHOGRAPHY; LIGHT EMITTING DIODES; PHOTONS;

LIGHT TRANSMISSION;

EID: 80055025089     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3648115     Document Type: Article

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