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Volumn 22, Issue 9, 2011, Pages 1313-1320

Barrier/bonding layers on bismuth telluride (Bi 2Te 3) for high temperature thermoelectric modules

Author keywords

[No Author keywords available]

Indexed keywords

AG ELECTRODE; ANNEALING PROCESS; BISMUTH TELLURIDE; ELECTRODE MATERIAL; HIGH TEMPERATURE; HIGH-TEMPERATURE THERMOELECTRIC APPLICATIONS; STEP COVERAGE; THERMOELECTRIC MODULES;

EID: 80054985854     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-011-0306-0     Document Type: Article
Times cited : (80)

References (18)
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    • Rowe, D.M.1
  • 6
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  • 8
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    • Electrical and thermal properties of Bi2Te3
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    • Satterthwaite, C.B.1
  • 11
    • 40849116611 scopus 로고    scopus 로고
    • Diffusion of nickel and tin in p-type (Bi, Sb)2Te3 and n-type Bi2(Te, Se)3 thermoelectric materials
    • Y.C. Lan, D.Z. Wang, G. Chen, Z.F. Ren, Diffusion of nickel and tin in p-type (Bi, Sb)2Te3 and n-type Bi2(Te, Se)3 thermoelectric materials. Appl. Phys. Lett. 92, 101910 (2008)
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  • 14
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    • Bonding/barrier layers on bismuth telluride (Bi2Te3) for high temperature applications
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.