-
2
-
-
27744534173
-
-
M. Suchea, S. Christoulakis, K. Moschovis, N. Katsarakis and G. Kiriakidis, Rev. Adv. Mater. Sci. 10, 335 (2005).
-
(2005)
Rev. Adv. Mater. Sci.
, vol.10
, pp. 335
-
-
Suchea, M.1
Christoulakis, S.2
Moschovis, K.3
Katsarakis, N.4
Kiriakidis, G.5
-
5
-
-
0036895382
-
-
W. Water, S. Y. Chu, Y. D. Juang and S. J. Wu, Mater. Lett. 57, 998 (2002).
-
(2002)
Mater. Lett.
, vol.57
, pp. 998
-
-
Water, W.1
Chu, S.Y.2
Juang, Y.D.3
Wu, S.J.4
-
6
-
-
43949088791
-
-
S. H. Jeong, B. N. Park, S. B. Lee and J. H. Boo, Thin Solid Films 516, 5586 (2008).
-
(2008)
Thin Solid Films
, vol.516
, pp. 5586
-
-
Jeong, S.H.1
Park, B.N.2
Lee, S.B.3
Boo, J.H.4
-
7
-
-
21244489354
-
-
Y. Chen, D. Bagnall and T. Yao, Mater. Sci. Eng., B 75, 190 (2000).
-
(2000)
Mater. Sci. Eng., B
, vol.75
, pp. 190
-
-
Chen, Y.1
Bagnall, D.2
Yao, T.3
-
8
-
-
55349136594
-
-
S. Ilican, Y. Caglar, M. Caglar and B. Demirci, J. Optoelectron. Adv. Mater. 10, 2592 (2008).
-
(2008)
J. Optoelectron. Adv. Mater.
, vol.10
, pp. 2592
-
-
Ilican, S.1
Caglar, Y.2
Caglar, M.3
Demirci, B.4
-
9
-
-
0042318637
-
-
A. V. Singh, M. Kumar, R. M. Mehra, A. Wakahara and A. Yoshida, J. Indian Inst. Sci. 81, 527 (2001).
-
(2001)
J. Indian Inst. Sci.
, vol.81
, pp. 527
-
-
Singh, A.V.1
Kumar, M.2
Mehra, R.M.3
Wakahara, A.4
Yoshida, A.5
-
10
-
-
20144388058
-
-
H.-U. Krebs, M. Weisheit, J. Faupel, E. Süske, T. Scharf, C. Fuhse, M. Störmer, K. Sturm, M. Seibt and H. Kijewski, Adv. Solid State Phys. 43, 101 (2003).
-
(2003)
Adv. Solid State Phys.
, vol.43
, pp. 101
-
-
Krebs, H.-U.1
Weisheit, M.2
Faupel, J.3
Süske, E.4
Scharf, T.5
Fuhse, C.6
Störmer, M.7
Sturm, K.8
Seibt, M.9
Kijewski, H.10
-
11
-
-
34250342158
-
-
H. Wang, H. B. Wang, F. J. Yang, Y. Chen, C. Zhang, C. P. Yang, Q. Li and S. P. Wong, Nanotechnology 17, 4312 (2006).
-
(2006)
Nanotechnology
, vol.17
, pp. 4312
-
-
Wang, H.1
Wang, H.B.2
Yang, F.J.3
Chen, Y.4
Zhang, C.5
Yang, C.P.6
Li, Q.7
Wong, S.P.8
-
12
-
-
0000379080
-
-
S. Cho, J. Ma, Y. Kim, Y. Sun, G. K. L. Wong and J. B. Ketterson, Appl. Phys. Lett. 75, 2761 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 2761
-
-
Cho, S.1
Ma, J.2
Kim, Y.3
Sun, Y.4
Wong, G.K.L.5
Ketterson, J.B.6
-
13
-
-
33745653884
-
-
C. Li, G. Fang, Q. Fu, F. Su, G. Li, X. Z. Wu and X. Zhao, J. Cryst. Growth 292, 19 (2006).
-
(2006)
J. Cryst. Growth
, vol.292
, pp. 19
-
-
Li, C.1
Fang, G.2
Fu, Q.3
Su, F.4
Li, G.5
Wu, X.Z.6
Zhao, X.7
-
14
-
-
0002081496
-
-
K. Vanheusden, W. L. Warren, C. H. Seager, D. R. Tallant and J. A. Voight, J. Appl. Phys. 79, 7983 (1996).
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 7983
-
-
Vanheusden, K.1
Warren, W.L.2
Seager, C.H.3
Tallant, D.R.4
Voight, J.A.5
-
15
-
-
67650490726
-
-
K. Das, S. Ray, S. Chaudhuri and A. B. Maity, Indian J. Pure Appl. Phys. 47, 377 (2009).
-
(2009)
Indian J. Pure Appl. Phys.
, vol.47
, pp. 377
-
-
Das, K.1
Ray, S.2
Chaudhuri, S.3
Maity, A.B.4
-
17
-
-
79959478929
-
-
P. Ruankham, T. Sagawa, H. Sakaguchi and S. Yoshikawa, J. Mater. Chem. 21, 9710 (2011).
-
(2011)
J. Mater. Chem.
, vol.21
, pp. 9710
-
-
Ruankham, P.1
Sagawa, T.2
Sakaguchi, H.3
Yoshikawa, S.4
-
19
-
-
79956046454
-
-
W. Z. Shen, L. F. Jiang, H. F. Yang and F. Y. Meng, Appl. Phys. Lett. 80, 2063 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 2063
-
-
Shen, W.Z.1
Jiang, L.F.2
Yang, H.F.3
Meng, F.Y.4
-
20
-
-
22944444544
-
-
S. T. Tan, B. J. Chen, X. W. Sun, W.J. Fan, H. S. Kwok, X. H. Zhang and S. J. Chua, J. Appl. Phys. 98, 013505 (2005).
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 013505
-
-
Tan, S.T.1
Chen, B.J.2
Sun, X.W.3
Fan, W.J.4
Kwok, H.S.5
Zhang, X.H.6
Chua, S.J.7
|