Nanostructured ZnO and ZAO transparent thin films by sputtering-surface characterization

Reviews on Advanced Materials Science

Volumn 10, Issue 4, 2005, Pages 335-340

  Suchea, Mira ^a,b   Christoulakis, S ^a,b   Moschovis, K ^a   Katsarakis, N ^a,c   Kiriakidis, G ^a,b  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

^c TECHNOLOGICAL EDUCATIONAL INSTITUTE OF CRETE   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; DEPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; X RAY DIFFRACTION;

ALUMINUM ZINC OXIDE (ZAO); DC MAGNETRON SPUTTERING TECHNIQUE; TRANSPARENT THIN FILMS;

ZINC OXIDE;

EID: 27744534173     PISSN: 16065131     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. Y. Chen, D. Bagnall and T. Yao// Mater. Sci. Eng. B 75 (2000) 190.
2. S.J. Chang, Y.K. Su and Y.P. Shei // J. Vac. Sci. Technol. A 13 (1995) 385.
3. J.G.E. Gardeniers, Z.M. Rittersma and G.J. Burger //J. Appl. Phys. 83 (1998) 7844.
4. W.W. Wenas, A. Yamada and K. Takahashi // J. Appl. Phys. 70 (1991) 7119.
5. J. Zhao, S. Xie, S. Han, Z. Yang, L. Ye and T. Yang // Synth. Met. 114 (2000) 251.
6. K. Ellmer // J. Phys. D 33 (2000) R17.
7. A. Malik, A. Seco, R. Nunes, E. Fortunato and R. Martins // Mater. Res. Soc. Symp. 471 (1997) 47.
8. W.H.G. Horsthuis // Thin Solid Films 137 (1986) 185.
9. M. Bender, N. Katsarakis, E. Gagaoudakis, E. Hourdakis, E. Douloufakis, V. Cimalla and G. Kiriakidis // J. Appl. Phys. 90 (2001) 5382.
10. V.D. Das, S. Kirupavathy, L. Damodare and N. Lakshminarayan // J. Appl. Phys. 79 (1996) 8521.
11. M. K. Tominaga, N. Ueshita, Y. Shintani and O. Tada // Jpn. J. Appl. Phys. 20-3 (1981) 519.