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Volumn 13, Issue 11, 2011, Pages 2037-2040
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Tunable dielectric thin films by aqueous, inorganic solution-based processing
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Author keywords
Aqueous solution deposition; Nanolaminate; Prompt inorganic condensation; Spin coating; Thin film; Tunable dielectric permittivity
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Indexed keywords
AMORPHOUS ALUMINUM OXIDE;
AQUEOUS SOLUTION DEPOSITION;
AVERAGING EFFECT;
DIELECTRIC THICKNESS;
DIELECTRIC THIN FILMS;
EFFECTIVE DIELECTRIC PERMITTIVITIES;
ELECTRICAL CHARACTERIZATION;
INORGANIC PRECURSOR;
INSULATING LAYERS;
LOSS TANGENT;
NANOLAMINATE;
PROCESSING APPROACH;
PROMPT INORGANIC CONDENSATION;
RELATIVE DIELECTRIC CONSTANT;
SUBMICRON;
THICKNESS RATIO;
THIN FILM INSULATORS;
TUNABLE DIELECTRIC PROPERTIES;
TUNABLE DIELECTRICS;
X-RAY REFLECTIVITY MEASUREMENTS;
ALUMINUM COATINGS;
AMORPHOUS FILMS;
COATINGS;
DEPOSITION;
DISPLAY DEVICES;
FILM THICKNESS;
HAFNIUM;
HAFNIUM OXIDES;
METAL INSULATOR BOUNDARIES;
OXIDE FILMS;
OXIDES;
PERMITTIVITY;
SCANNING ELECTRON MICROSCOPY;
THIN FILMS;
VAPOR DEPOSITION;
DIELECTRIC MATERIALS;
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EID: 80054956970
PISSN: 12932558
EISSN: None
Source Type: Journal
DOI: 10.1016/j.solidstatesciences.2011.09.007 Document Type: Article |
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Times cited : (18)
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References (5)
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