Deposition of alumina thin film by dual magnetron sputtering: Is it γ-Al2O3?

Acta Materialia

Volumn 59, Issue 20, 2011, Pages 7757-7767

  Engelhart, W ^a,c   Dreher, W ^b   Eibl, O ^c   Schier, V ^a  

^a Walter AG   (Germany)

^b UNIVERSITY OF TÜBINGEN   (Germany)

^c UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

Alumina; Ceramic material; Microstructures; Nanostructure; Thin films

Indexed keywords

ALUMINA GRAINS; ALUMINA THIN FILMS; BULK MATERIALS; CEMENTED CARBIDE SUBSTRATES; CHEMICAL COMPOSITIONS; DARK FIELD IMAGING; DUAL MAGNETRON SPUTTERING; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; INTENSITY DISTRIBUTION; LATTICE SPACING; MOLE FRACTION RATIO; REFERENCE MATERIAL; TRANSMISSION ELECTRON MICROSCOPE; YOUNG'S MODULUS;

ALUMINUM; CARBIDES; CERAMIC MATERIALS; CRYSTAL STRUCTURE; DEPOSITION; DIFFRACTION; ENERGY DISPERSIVE SPECTROSCOPY; NANOINDENTATION; OPTICAL FILMS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; VICKERS HARDNESS;

O RINGS;

EID: 80054108515     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2011.08.048     Document Type: Article

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