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Volumn 43, Issue 11, 2011, Pages 1430-1435
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Depth resolution and inhomogeneity of the sputtering dose with sample rotation and ion beam rastering
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Author keywords
AES; depth profiling; rotation; roughening; SIMS; XPS
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Indexed keywords
AES;
BEAM RASTERING;
BEAM SIZE;
DEPTH RESOLUTION;
INHOMOGENEITIES;
ION DOSE;
LINE SPACING;
MEASURED DEPTHS;
PRACTICAL ISSUES;
RATIONAL NUMBERS;
RELATIVE STANDARD DEVIATIONS;
ROTATION FREQUENCIES;
ROTATIONAL FREQUENCY;
ROUGHENING;
SAMPLE ROTATION;
SPATIAL VARIATIONS;
SPUTTER-DEPTH PROFILING;
BEAM PLASMA INTERACTIONS;
DEPTH PROFILING;
ION BEAMS;
ION BOMBARDMENT;
IONS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ROTATION;
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EID: 80053953468
PISSN: 01422421
EISSN: 10969918
Source Type: Journal
DOI: 10.1002/sia.3735 Document Type: Article |
Times cited : (6)
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References (21)
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