A study of highly crystalline novel beryllium oxide film using atomic layer deposition

Journal of Crystal Growth

Volumn 334, Issue 1, 2011, Pages 126-133

  Yum, J H ^a,b   Akyol, T ^a   Lei, M ^c   Ferrer, D A ^a   Hudnall, Todd W ^d   Downer, M ^c   Bielawski, C W ^d   Bersuker, G ^b   Lee, J C ^a   Banerjee, S K ^a  

^a The University of Texas at Austin   (United States)

^b SEMATECH   (United States)

^c UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^d University of Texas at Austin   (United States)

Author keywords

A1. Crystal structure; B1. Oxides; B2. Dielectric materials

Indexed keywords

ALD GROWTH; BOND DISTANCE; CRYSTALLINITIES; DEVICE APPLICATION; GAAS SUBSTRATES; GAAS(1 0 0); HIGH ENERGY; HIGH THERMAL STABILITY; HIGH-K GATE DIELECTRICS; INTERFACE PASSIVATION; PHYSICAL CHARACTERISTICS; SI(1 0 0); WURTZITE STRUCTURE; XRD;

ATOMIC LAYER DEPOSITION; ATOMS; BERYLLIUM; CRYSTAL ATOMIC STRUCTURE; CRYSTALLINE MATERIALS; GALLIUM ARSENIDE; GATE DIELECTRICS; GERMANIUM; INTERFACES (MATERIALS); OXIDE FILMS; PASSIVATION; SEMICONDUCTING GALLIUM; SUBSTRATES; ZINC SULFIDE;

DIELECTRIC MATERIALS;

EID: 80053335489     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.08.040     Document Type: Article

References (16)

1. Y. Ma, Y. Ono, L. Stecker, D.R. Evans, and S.T. Hsu Technical Digest - International Electron Devices Meeting 149 1999
2. B.H. Lee, Kang.W.-J. Qi, R. Nieh, Y. Jeon, K. Onishi, and J.C. Lee Technical Digest - International Electron Devices Meeting 133 1999
3. S. Jeon, Ch.J. Choi, T.Y. Seong, and H. Hwang Applied Physics Letters 79 2001 245
4. J. Kwo Journal of Applied Physics 89 2001 3920
5. A.C. Seabaugh, J.H. Luscombe, J.N. Randall, P.C. Colter, A. Dip, G.Mo. Eldallal, and S.M. Bedair Thin solid films 225 1993 99 104
6. W. Pan, J.J. Lu, J. Chen, and W.Z. Shen Physical Review B 74 2006 125308
7. G. Wang, Y. Deng, and L. Guo Chemistry 16 33 2010 10220 10225
8. M.B. Zahid, A. Arreghini, R. Degraeve, B. Govoreanu, A. Suhane, and J. Van Houdt Electron Device Letters 31 2010 1158 1160
9. K.J. Hubbard, and D.G. Schlom Journal of Material Research 11 1996 2757 2776
10. V.A. Sashin, M.A. Bolorizadeh, A.S. Kheifets, and M.J. Ford Journal of Physics: Condensed Matter 15 2003 3567
11. American Beryllia Incorporation, 〈http://www.americanberyllia.com/ 〉.
12. J.H. Yum, T. Akyol, M. Lei, T. Hudnall, G. Bersuker, M. Downer, C.W. Bielawski, J.C. Lee, and S.K. Banerjee Journal of Applied Physics 109 2011 064101
13. H. Gilman, and F. Schulze Journal of the Chemical Society 49 1927 2663 2669
14. Cambridge Nanotech ALD, 〈http://www.cambridgenanotech.com/products/ savannah.php〉.
15. D.R.G. Mitchell, D.J. Attard, and G. Triani Thin Solid Films 441 2003 85 93
16. M. Ohring, Material Science of Thin Films, 2nd edition, (Chapter 7).