Band gap opening of graphene after UV/ozone and oxygen plasma treatments

Materials Research Society Symposium Proceedings

Volumn 1284, Issue , 2011, Pages 117-122

  Aria, Adrianus I ^a   Gani, Adi W ^b   Gharib, Morteza ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAPS; BANDGAP OPENINGS; DEGREE OF OXIDATIONS; HIGH-THROUGHPUT; OXIDATION RATES; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; SITE-SPECIFIC; SPECTROSCOPY MEASUREMENTS; UV/OZONE; UV/OZONE TREATMENT;

CHEMICAL VAPOR DEPOSITION; ENERGY GAP; MICROELECTRONICS; OXIDATION; OXYGEN; PLASMA DEPOSITION; PLASMAS; RAMAN SPECTROSCOPY;

GRAPHENE;

EID: 80053246713     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2011.222     Document Type: Conference Paper

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