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Advanced Functional Materials

Volumn 15, Issue 2, 2005, Pages 209-216

Acrylate-based photopolymer for two-photon microfabrication and photonic applications

(3) Nguyen, Le Huong a Straub, Martin a Gu, Min a

a SWINBURNE UNIVERSITY OF TECHNOLOGY (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

FREE RADICAL POLYMERIZATION; LIGHT ABSORPTION; MICROSTRUCTURE; NANOTECHNOLOGY; OLIGOMERS; OPTIMIZATION; ORGANIC SOLVENTS; PHOTONS; PHOTOPOLYMERIZATION; PHOTORESISTS; RAPID PROTOTYPING; THERMOGRAVIMETRIC ANALYSIS;

ACRYLATE-BASED PHOTOPOLYMERS; PHOTONIC APPLICATIONS; STEREOLITHOGRAPHY; TWO-PHOTON ABSORPTION; TWO-PHOTON MICROFABRICATION;

POLYACRYLATES;

EID: 15244341069 PISSN: 1616301X EISSN: None Source Type: Journal
DOI: 10.1002/adfm.200400212 Document Type: Article

Times cited : (131)

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