High-performance microring resonators fabricated with multiphoton absorption polymerization

Advanced Materials

Volumn 20, Issue 19, 2008, Pages 3668-3671

  Li, Linjie ^a   Gershgoren, Erez ^a   Kumi, George ^a   Chen, Wei Yen ^c   Ho, P T ^c   Herman, Warren N ^b   Fourkas, John T ^a,b,c  

^a University of Maryland   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; ABSORPTION; CURING; FUNCTIONAL POLYMERS; MICROCHANNELS; MONOMERS; MULTIPHOTON PROCESSES; OPTICAL INSTRUMENTS; OXYGEN; POLYMERIC GLASS; POLYMERS; SILICON; SILICON WAFERS; SILICONES; THICKNESS MEASUREMENT;

AIR BUBBLES; CURING AGENTS; DIRECT WRITINGS; GLASS COVERS; HIGH-PERFORMANCE; MASS RATIOS; MICRORING RESONATORS; MULTIPHOTON ABSORPTION POLYMERIZATIONS; OXYGEN PLASMAS; RAZOR BLADES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 54949105802     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200800032     Document Type: Article

References (30)

1. H. B. Sun, S. Kawata, J. Lightwave Technol. 2003, 21, 624.
2. C. N. LaFratta, J. T. Fourkas, T. Baldacchini, R. A. Farrer, Angew. Chem. Int. Ed. 2007, 46, 6238.
3. S. R. Marder, J.-L. Brédas, J. W. Perry, MRS Bull. 2007, 32, 561.
4. D. Yang, S. J. Jhaveri, C. K. Ober, MRS Bull. 2005, 30, 976.
5. B. H. Cumpston, S. P. Ananthavel, S. Barlow, D. L. Dyer, J. E. Ehrlich, L. L. Erskine, A. A. Heikal, S. M. Kuebler, I. Y. S. Lee, D. McCordMaughon, J. Q. Qin, H. Rockel, M. Rumi, X. L. Wu, S. R. Marder, J. W. Perry, Nature 1999, 398, 51.
6. M. Deubel, O. Von Freymann, M. Wegener, S. Pereira, K. Busch, C. M. Soukoulis, Nat. Mater. 2004, 3, 444.
7. N. Tetreault, G. von Freymann, M. Deubel, M. Hermatschweiler, F. Perez-Willard, S. John, M. Wegener, G. A. Ozin, Adv. Mater. 2006, 18, 457.
8. R. Quo, S. Xiao, X. Zhai, J. Li, A. Xia, W. Huang, Opt. Express 2006, 14, 810.
9. S. Yokoyama, T. Nakahama, H. Miki, S. Mashiko, Thin Solid Films 2003, 438, 452.
10. J. Ishihara, K. Komatsu, O. Sugihara, T. Kaino, Appl. Phys. Lett. 2007, 90, 033511.
11. S. Klein, A. Barsella, H. Leblond, H. Bulou, A. Fort, C. Andraud, O. Lemercier, J. C. Mulatier, K. Dorkenoo, Appl. Phys. Lett. 2005, 86, 211118.
12. J. Serbin, M. Ou, Opt. Express 2006, 14, 3563.
13. L. Chen, N. Sherwood-Droz, M. Lipson, Opt. Lett. 2007, 32, 3361.
14. R. Grover, T. A. Ibrahim, T. N. Ding, Y. Leng, L. C. Kuo, S. Kanakaraju, K. Amarnath, L. C. Calhoun, P. T. Ho, IEEE Photon. Technol. Lett. 2003, 15, 1082.
15. S. Xiao, M. H. Khan, H. Shen, M. Qi, Opt. Express 2007, 15, 14467.
16. G. H. V. Rhodes, B. B. Goldberg, M. S. Unlu, S. T. Chu, B. E. Little, IEEE J. Sci. Top. Quantum Electron. 2000, 6, 46.
17. W. Y. Chen, R. Grover, T. A. Ibrahim, V. Van, W. N. Herman, P. T. Ho, IEEE Phot. Tech. Lett. 2004, 16, 470.
18. W. Y. Chen, V. Van, W. N. Herman, P. T. Ho, IEEE Phot. Tech. Lett. 2006, 18, 2041.
19. J. K. S. Poon, Y. Y. Huang, G. T. Paloczi, A. Yariv, IEEE Phot. Tech. Lett. 2004, 16, 2496.
20. H. C. Song, M. C. Oh, S. W. Ahn, W. H. Steier, H. R. Fetterman, C. Zhang, Appl. Phys. Lett. 2003, 82, 4432.
21. J.-F. Xing, X.-Z. Dong, W.-Q. Chen, X.-M. Duan, N. Takeyasu, T. Tanaka, S. Kawata, Appl. Phys. Lett. 2007, 90, 131106.
22. T. Baldacchini, C. LaFratta, R. A. Farrer, M. C. Teich, B. E. A. Saleh, M. J. Naughton, J. T. Fourkas, J. Appl. Phys. 2004, 95, 6072.
23. V. Van, P. P. Absil, J. V. Hryniewicz, P. T. Ho, J. Lightwave Technol. 2001, 19, 1734.
24. L. Eidada, L. W. Shacklette, IEEE J. Sci. Top. Quantum Electron. 2000, 6, 54.
25. T. A. Ibrahim, R. Grover, L. C. Kuo, S. Kanakaraju, L. C. Calhoun, P. T. Ho, IEEE Phot. Tech. Lett. 2003, 15, 1422.
26. C. Li, L. J. Zhou, A. W. Poon, Opt. Express 2007, 15, 5069.
27. S. Mikroulis, H. Simos, E. Roditi, D. Syvridis, IEEE Phot. Tech. Lett. 2005, 17, 1878.
28. C. Y. Chao, L. J. Quo, Appl. Phys. Lett. 2003, 83, 1527.
29. R. A. Farrer, C. N. LaFratta, L. J. Li, J. Praino, M. J. Naughton, B. E. A. Saleh, M. C. Teich, J. T. Fourkas, J. Am. Chem. Soc. 2006, 128, 1796.
30. Y. X. Zhuang, O. Hansen, T. Knieling, C. Wang, P. Rombach, W. Lang, W. Benecke, M. Kehlenbeck, J. Koblitz, J. Micromech. Microeng. 2006, 16, 2259.