Single-monomer acrylate-based resin for three-dimensional photonic crystal fabrication

Polymer

Volumn 46, Issue 23, 2005, Pages 10246-10255

  Wu, Shuhui ^a   Straub, Martin ^a   Gu, Min ^a  

^a SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

Photosensitive resin; Three dimensional microfabrication; Two photon photopolymerisation

Indexed keywords

CRYSTAL STRUCTURE; FREE RADICAL POLYMERIZATION; KETONES; LIGHT TRANSMISSION; MONOMERS; PHOTONS; PHOTOPOLYMERIZATION;

PHOTOCURING; PHOTOSENSITIVE RESINS; THREE-DIMENSIONAL MICROFABRICATION; TWO-PHOTON PHOTOPOLYMERIZATION;

RESINS;

POLYMER SCIENCE;

EID: 26844575131     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2005.08.030     Document Type: Article

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