Pulsed laser deposition and characterisation of perovskite-type LaTiO 3-xNx thin films

Acta Materialia

Volumn 59, Issue 19, 2011, Pages 7145-7154

  Marozau, I ^a   Shkabko, A ^b   Dobeli M ^c   Lippert, T ^a   Mallepell, M ^c   Schneider, C W ^a   Weidenkaff, A ^b   Wokaun, A ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^c ETH ZURICH   (Switzerland)

Author keywords

Lanthanum titanate; Oxynitride; Pulsed laser deposition; Strontium titanate; Thin film

Indexed keywords

AT-WAVELENGTH; BAND GAP ENERGY; BAND GAPS; CHARACTERISATION; GAS PULSE; HIGH NITROGEN CONTENT; LANTHANUM TITANATE; N CONTENT; NITROGEN CONTENT; ONE-STEP PROCESS; ORBITALS; OXYNITRIDES; PEROVSKITE-TYPE STRUCTURE; POLYCRYSTALLINE; SUBSTRATE TEMPERATURE; VISIBLE LIGHT ABSORPTION;

ABLATION; DEPOSITION; ENERGY GAP; LANTHANUM; LANTHANUM ALLOYS; LIGHT ABSORPTION; NITRIDES; NITROGEN; PEROVSKITE; PULSED LASER DEPOSITION; STRONTIUM; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

PULSED LASERS;

EID: 80053174558     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2011.08.019     Document Type: Article

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