Improvement of properties of SrTiO3 thin films deposited at low temperature and high rate by sputtering gas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 6 A, 2000, Pages 3519-3523

  Kohara, Naoki ^a   Yoshida, Akihisa ^a   Sawada, Taisuke ^a   Kitagawa, Masatoshi ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

High deposition rate; Low substrate temperature; N2 gas; OES; SrTiO3 thin films

Indexed keywords

ALUMINUM; AMORPHOUS MATERIALS; CURRENT DENSITY; GLASS; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; NITROGEN; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; STRONTIUM COMPOUNDS; THIN FILMS;

STRONTIUM TITANATE;

DIELECTRIC FILMS;

EID: 0034206502     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.3519     Document Type: Article

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