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Volumn 311-313, Issue , 2011, Pages 1810-1813

Microstructure and nanoindentation hardness of sputter deposited nanocrystalline tantalum thin films

Author keywords

Grain boundary; Hall Petch; Nanocrystalline tantalum film; Nanoindentation Hardness

Indexed keywords

COARSE-GRAINED; DIRECT-CURRENT MAGNETRON SPUTTERING; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; GRAIN SIZE; HALL PETCH RELATIONSHIP; HALL-PETCH; INDENTATION HARDNESS; NANOCRYSTALLINES; NANOINDENTATION HARDNESS; NANOINDENTERS; SI (100) SUBSTRATE; TA FILMS; TANTALUM THIN FILM;

EID: 80053038906     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.311-313.1810     Document Type: Conference Paper
Times cited : (3)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.