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Volumn 311-313, Issue , 2011, Pages 1810-1813
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Microstructure and nanoindentation hardness of sputter deposited nanocrystalline tantalum thin films
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Author keywords
Grain boundary; Hall Petch; Nanocrystalline tantalum film; Nanoindentation Hardness
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Indexed keywords
COARSE-GRAINED;
DIRECT-CURRENT MAGNETRON SPUTTERING;
FIELD EMISSION SCANNING ELECTRON MICROSCOPES;
GRAIN SIZE;
HALL PETCH RELATIONSHIP;
HALL-PETCH;
INDENTATION HARDNESS;
NANOCRYSTALLINES;
NANOINDENTATION HARDNESS;
NANOINDENTERS;
SI (100) SUBSTRATE;
TA FILMS;
TANTALUM THIN FILM;
DESIGN;
GRAIN BOUNDARIES;
GRAIN SIZE AND SHAPE;
HARDNESS;
MANUFACTURE;
NANOCRYSTALLINE MATERIALS;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
TANTALUM;
THIN FILMS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
NANOINDENTATION;
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EID: 80053038906
PISSN: 10226680
EISSN: None
Source Type: Book Series
DOI: 10.4028/www.scientific.net/AMR.311-313.1810 Document Type: Conference Paper |
Times cited : (3)
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References (7)
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