Switchable reflectivity on silicon from a composite VO 2-SiO 2 protecting layer

Applied Physics Letters

Volumn 85, Issue 8, 2004, Pages 1410-1412

  Lopez, R ^a,b   Boatner, L A ^a   Haynes, T E ^a   Haglund Jr , R F ^b   Feldman, L C ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b VANDERBILT UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MIE SCATTERING; TETRAGONAL RUTILE PHASE; THERMAL PROCESSING; VANADIUM DIOXIDE;

ANNEALING; HEATING; NANOSTRUCTURED MATERIALS; OPTICAL SWITCHES; PHASE TRANSITIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SINGLE CRYSTALS; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

SILICA;

EID: 4544280148     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1784546     Document Type: Article

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