Topographical evolution of magnetron sputtering Ti thin films during oxidation observed by AFM

Surface Review and Letters

Volumn 18, Issue 1-2, 2011, Pages 61-69

  Li, Xinyue ^a   Jin, Yongzhong ^a   Liu, Dongliang ^a   Zeng, Xianguang ^a   Yang, Ruisong ^a  

^a SICHUAN UNIVERSITY OF SCIENCE AND ENGINEERING   (China)

Author keywords

atomic force microscopy; magnetron sputtering; oxidation; Ti films; topographical evolution

Indexed keywords

AFM; AMORPHOUS-LIKE; ANNEALING TEMPERATURES; ANNEALING TIME; CRYSTAL TEXTURE; CRYSTALLINE FEATURE; CRYSTALLINE STATE; DEEP GROOVE; GLASS SUBSTRATES; GRAIN SIZE; GROOVING EFFECTS; LOW TEMPERATURES; OXYGEN ATMOSPHERE; ROOM TEMPERATURE; TI FILMS; TI THIN FILMS; TITANIUM FILM; TOPOGRAPHICAL EVOLUTION;

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; GRAIN GROWTH; GRAIN SIZE AND SHAPE; NUCLEATION; OXIDATION; SUBSTRATES; SURFACE ROUGHNESS; TITANIUM; TITANIUM OXIDES;

ATMOSPHERIC TEMPERATURE;

EID: 80052575014     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X1101428X     Document Type: Article

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