Improved optical transmittance of Al-doped ZnO thin films by use of ZnO nanorods

Materials Chemistry and Physics

Volumn 130, Issue 1-2, 2011, Pages 619-623

  Lu, Wei Lun ^a   Hung, Pin Kun ^a   Hung, Chen I ^a   Yeh, Chih Hung ^b   Houng, Mau Phon ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NexPower Technology Corporation   (Taiwan)

Author keywords

Nucleation; Optical properties; Sputtering; Thin films

Indexed keywords

AIR VOLUMES; AL-DOPED ZNO; AMORPHOUS SI; AQUEOUS CHEMICAL GROWTH; AT-WAVELENGTH; EFFECTIVE MEDIUM APPROXIMATION; THIN FILM SOLAR CELLS; TRANSPARENT CONDUCTING ELECTRODES; TRANSPARENT CONDUCTING OXIDE; WAVELENGTH REGIONS; ZNO NANOROD;

AMORPHOUS FILMS; AMORPHOUS SILICON; METALLIC FILMS; NANORODS; OPACITY; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; ZINC OXIDE;

ALUMINUM;

EID: 80052573469     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2011.07.034     Document Type: Article

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