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Volumn 183, Issue 9, 2010, Pages 2205-2217
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Preparation of ZnO:CeO2x thin films by AP-MOCVD: Structural and optical properties
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Author keywords
AP MOCVD; Morphology; Optical properties; Structural characterization; ZnO:CeO2 x thin films
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Indexed keywords
ALUMINUM ALLOY SUBSTRATE;
CERIUM CONTENT;
CERIUM DOPING;
COMPACT STRUCTURES;
CRYSTALLINITIES;
CRYSTALLOGRAPHIC ORIENTATIONS;
DEPOSITION CONDITIONS;
DEPOSITION PROCESS;
FLOWER-LIKE;
GROWTH PROCESS;
HEXAGONAL STRUCTURES;
METAL ACETYLACETONATES;
METALORGANIC CHEMICAL VAPOR DEPOSITION;
MILD OPERATING CONDITIONS;
MOCVD;
OPTICAL TRANSMISSIONS;
OPTICAL TRANSMITTANCE;
PREFERRED ORIENTATIONS;
PURE ZNO;
ROUND STRUCTURE;
SEM;
STRUCTURAL AND OPTICAL PROPERTIES;
STRUCTURAL CHARACTERIZATION;
SUBSTRATE NATURE;
TEM;
UV ABSORBERS;
UV ABSORPTION;
UV-VIS SPECTROSCOPY;
ZNO;
ALUMINUM COATINGS;
ATMOSPHERIC PRESSURE;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
CERIUM;
FILM PREPARATION;
INDUSTRIAL APPLICATIONS;
LATTICE MISMATCH;
LIGHT TRANSMISSION;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MORPHOLOGY;
OPTICAL CORRELATION;
OPTICAL PROPERTIES;
ORGANIC CHEMICALS;
QUARTZ;
SCANNING ELECTRON MICROSCOPY;
STRUCTURAL PROPERTIES;
SUBSTRATES;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
ZINC OXIDE;
OPTICAL FILMS;
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EID: 80052267690
PISSN: 00224596
EISSN: 1095726X
Source Type: Journal
DOI: 10.1016/j.jssc.2010.07.037 Document Type: Article |
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Times cited : (20)
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References (54)
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