SCOPUS 정보 검색 플랫폼

Volumn 519, Issue 22, 2011, Pages 7803-7808

Effects of atomic layer deposited HfO2 compact layer on the performance of dye-sensitized solar cells

(3) Bills, Braden a Shanmugam, Mariyappan a Baroughi, Mahdi Farrokh a

a South Dakota State University (United States)

Author keywords

Atomic force microscopy; Atomic layer deposition; Compact layer; Dye sensitized solar cells; Electrochemical impedance spectroscopy; Hafnium oxide

Indexed keywords

ATOMIC FORCE; ATOMIC LAYER DEPOSITED; COMPACT LAYER; CURRENT VOLTAGE; DEPOSITION METHODS; DYE-SENSITIZED SOLAR CELL; DYE-SENSITIZED SOLAR CELLS; ELECTROCHEMICAL IMPEDANCE; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY MEASUREMENTS; ELECTRON RECOMBINATIONS; ELECTRONIC QUALITY; INTERFACIAL RESISTANCES; LIQUID ELECTROLYTES; MICROSCOPIC IMAGE; PHOTOCONVERSION EFFICIENCY; PHOTOELECTRODE; PHOTOGENERATED ELECTRONS; PHOTOVOLTAIC PERFORMANCE; POROUS NANOPARTICLES; TIO; TRANSPARENT CONDUCTING OXIDE; ULTRA-THIN;

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYTES; ELECTRONS; HAFNIUM; HAFNIUM OXIDES; LIQUIDS; NANOSTRUCTURED MATERIALS; OXIDES; PASSIVATION; PHOTOELECTROCHEMICAL CELLS; SOLAR POWER GENERATION; TITANIUM DIOXIDE;

SOLAR CELLS;

EID: 80052129143 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.05.007 Document Type: Article

Times cited : (55)

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