Negative-photoresist mechanical property for nano-filtration membrane embedded in microfluidics

2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

Volumn , Issue , 2011, Pages 2706-2709

  Hirai, Y ^a   Uesugi, A ^a   Makino, Y ^a   Yagyu, H ^b   Sugano, K ^a   Tsuchiya, T ^a   Tabata, O ^a  

^a KYOTO UNIVERSITY   (Japan)

^b Limited   (Japan)

Author keywords

3D UV photolithography; Mechanical property; Membrane; Microfluidics; Nanoindentation

Indexed keywords

3D UV PHOTOLITHOGRAPHY; EPOXY GROUP; FILTRATION MEMBRANES; INDENTATION TEST; MICRO FLUIDIC SYSTEM; PROCESS PARAMETERS;

ACTUATORS; ELASTIC MODULI; EMBEDDED SYSTEMS; MECHANICAL PERMEABILITY; MEMBRANES; MICROFLUIDICS; MICROSYSTEMS; NANOINDENTATION; PHOTORESISTS; SOLID-STATE SENSORS;

MICROFILTRATION;

EID: 80052109388     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/TRANSDUCERS.2011.5969546     Document Type: Conference Paper

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