Controlling Cu diffusion in Co films grown on Cu(001)

Surface Science

Volumn 605, Issue 21-22, 2011, Pages 1875-1880

  Allmers, T ^a   Donath, M ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Alloys; Cobalt; Copper; Growth; Photoelectron spectroscopy; Scanning tunneling microscopy; Surface structure, morphology, roughness, and topography

Indexed keywords

ATOMICALLY SMOOTH SURFACE; CHEMICAL COMPOSITIONS; CO FILMS; CU DIFFUSION; CU IMPURITY; HIGHER TEMPERATURES; LOW TEMPERATURES; ROOM TEMPERATURE; ROUGH SURFACES; SAMPLE TEMPERATURE; SURFACE STRUCTURE, MORPHOLOGY, ROUGHNESS, AND TOPOGRAPHY; TIME-SCALES; ULTRATHIN CO FILMS;

CERIUM ALLOYS; COBALT; DIFFUSION; EMISSION SPECTROSCOPY; FILM GROWTH; METALLIC FILMS; MONOLAYERS; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SUBSTRATES; SURFACE MORPHOLOGY; SURFACE TOPOGRAPHY; TOPOGRAPHY; ULTRATHIN FILMS;

COPPER;

EID: 80052024927     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2011.05.012     Document Type: Article

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