Preparation and characterization of solid-state sintered aluminum-doped zinc oxide with different alumina contents

Bulletin of Materials Science

Volumn 34, Issue 3, 2011, Pages 477-482

  Chou, Yu Hsien ^a   Chau, J L H ^a   Lwang, W ^a   Chen, C S ^a   Wang, S H ^a   Yang, C C ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

AZO target; AZO thin film; Resistivity; ZnAl2O4 spinel

Indexed keywords

ADDITION OF AL; ALUMINA CONTENT; ALUMINUM-DOPED ZINC OXIDE; AZO FILMS; AZO TARGET; AZO THIN FILMS; DOPED ZNO; ELECTRICAL RESISTIVITY; OPTICAL TRANSPARENCY; PHASE TRANSFORMATION; RELATIVE DENSITY; SECOND PHASE; SOLID-STATE REACTION TECHNIQUES; TRIPLE JUNCTION; VISIBLE REGION; ZNAL2O4 SPINEL; ZNO;

ALUMINUM; CERAMIC MATERIALS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; FILM PREPARATION; GRAIN BOUNDARIES; SINTERING; STACKING FAULTS; ZINC; ZINC OXIDE;

SINTERED ALUMINA;

EID: 80051905690     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-011-0112-6     Document Type: Article

References (16)

1. Ben Ayadi Z et al 2008 Mater. Sci. Eng. C 28 613
2. Chatelon J P et al 1997 J. Sol-Gel Sci. Technol. 10 185
3. Chopra K L et al 1983 Thin Solid Films 102 1
4. Coutts T J et al 2000 J. Vac. Sci. Technol. A 18 2646
5. Han J, Mantas P Q and Senos A M R 2001a J. Eur. Ceram. Soc. 21 1883
6. Han J, Mantas P Q and Senos A M R 2001b J. Mater. Res. 16 459
7. Jeong S et al 2003 Thin Solid Films 435 78
8. Lin J C et al 2009 Thin Solid Films 517 4715
9. Liu K W et al 2010 J. Appl. Phys. 108 043516
10. Rahaman M N 1995 Ceramic processing and sintering (New York: Marcel Dekker)
11. Sharma S K and Exarhos G J 1995 Thin Solid Films 270 27
12. Sieber I et al 1998 Thin Solid Films 330 108
13. Tang W and Cameron D C 1994 Thin Solid Films 238 83
14. Thonke K et al 2009 Microelectron. J. 40 210
15. Tominaga K et al 1999 Thin Solid Films 343-344 160
16. Zhang J et al 2006 J. Am. Ceram. Soc. 89 3874