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Volumn 257, Issue 23, 2011, Pages 10172-10176

Cleaning of SiC surfaces by low temperature ECR microwave hydrogen plasma

(5) Huang, Lingqin a Zhu, Qiaozhi a Gao, Mingchao a Qin, Fuwen a Wang, Dejun a

a DALIAN UNIVERSITY OF TECHNOLOGY (China)

Author keywords

4H SiC; Electronic cyclotron resonance hydrogen plasma; Reflection high energy electron diffraction; Surface cleaning; X ray photoelectron spectroscopy

Indexed keywords

CYCLOTRON RESONANCE; CYCLOTRONS; ELECTRONIC PROPERTIES; FERMI LEVEL; PHOTOELECTRONS; PHOTONS; PLASMA APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON CARBIDE; SURFACE CLEANING; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY;

4H-SIC; CARBON CONTAMINATION; ELECTRONIC CYCLOTRON RESONANCE; HYDROGEN PLASMA TREATMENTS; HYDROGEN PLASMAS; LOW TEMPERATURES; SITU REFLECTION; TREATMENT TEMPERATURE;

SILICON COMPOUNDS;

EID: 80051793310 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.07.012 Document Type: Article

Times cited : (29)

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