메뉴 건너뛰기




Volumn 4, Issue 5, 2010, Pages 976-984

A newly developed X-Y planar nano-motion table system with large travel ranges

Author keywords

Large travel range; Nano positioning; Non contact; Planar motion

Indexed keywords

AEROSTATIC BEARINGS; CENTER OF GRAVITY; FRAME STRUCTURE; LARGE TRAVEL; LASER INTERFEROMETER; MOTION MECHANISMS; MULTIPLE DEGREES OF FREEDOM; NANO-POSITIONING; NEW DESIGN; NON-CONTACT; NON-CONTACT CONDITIONS; PERFORMANCE EVALUATION; PLANAR MOTION; PRECISION MOTION CONTROL; SCIENTIFIC INSTRUMENT; SEMI-CONDUCTOR FABRICATION; SYSTEM-BASED; VOICE COIL MOTORS;

EID: 80051691811     PISSN: None     EISSN: 18813054     Source Type: Journal    
DOI: 10.1299/jamdsm.4.976     Document Type: Article
Times cited : (26)

References (8)
  • 1
    • 0034959603 scopus 로고    scopus 로고
    • High speed nanometer positioning using a hybrid linear motor
    • Shinno, H. and Hashizume, H., High Speed Nanometer Positioning Using a Hybrid Linear Motor, Annals of the CIRP, Vol.50, No.1(2001), pp.243-246. (Pubitemid 32610817)
    • (2001) CIRP Annals - Manufacturing Technology , vol.50 , Issue.1 , pp. 243-246
    • Shinno, H.1    Hashizume, H.2
  • 2
    • 73249118065 scopus 로고    scopus 로고
    • A Newly Developed Linear Motor-Driven Aerostatic X-Y Planar Motion Table System for Nano-Machining
    • DOI 10.1016/j.cirp.2007.05.086, PII S000785060700090X
    • Shinno, H., Yoshioka, H. and Taniguchi, K., A Newly Developed Linear Motor-Driven Aerostatic X-Y Planar Motion Table System for Nano-Machining, Annals of CIRP, Vol.56, No.1(2007), pp.369-372. (Pubitemid 46898319)
    • (2007) CIRP Annals - Manufacturing Technology , vol.56 , Issue.1 , pp. 369-372
    • Shinno, H.1    Yoshioka, H.2    Taniguchi, K.3
  • 4
    • 0030720423 scopus 로고    scopus 로고
    • Linear motor-levitated stage for photolithography
    • Kim, W-J., and Trumper, D.L., Linear Motor-Levitated Stage for Photolithography, Annals of the CIRP, Vol.46, No.1(1997), pp.447-450.
    • (1997) Annals of the CIRP , vol.46 , Issue.1 , pp. 447-450
    • Kim, W.-J.1    Trumper, D.L.2
  • 5
    • 0031220840 scopus 로고    scopus 로고
    • An ultraprecision stage for alignment of wafers in advanced microlithography
    • PII S0141635997000809
    • Chang-Woo and Seung-Woo Kim, An Ultraprecision Stage for Alignment of Wafers in Advanced Microlithography, Precision Engineering, Vol.21, No.2-3(1997), pp.113-122. (Pubitemid 127436597)
    • (1997) Precision Engineering , vol.21 , Issue.2-3 , pp. 113-122
    • Lee, C.-W.1    Kim, S.-W.2
  • 6
    • 84883712406 scopus 로고    scopus 로고
    • Control performance of two-stage positioning system (comparison of positioning performances with four kinds of control methods
    • Sato, K., Furuya, M., Shinano, F., Shinshi, T., Tachikawa, H. and Shimokohbe, A., Control Performance of Two-stage Positioning System (Comparison of Positioning performances with Four Kinds of Control Methods), The Japan Society of Mechanical Engineers, Vol.66, No.643(2000), pp.189-196.
    • (2000) The Japan Society of Mechanical Engineers , vol.66 , Issue.643 , pp. 189-196
    • Sato, K.1    Furuya, M.2    Shinano, F.3    Shinshi, T.4    Tachikawa, H.5    Shimokohbe, A.6
  • 8
    • 0029696083 scopus 로고    scopus 로고
    • High-response X-Y stage system driven by in-parallel linear motors
    • Tomita, Y., Makino, K. and Sugimine, M., High Response X-Y Stage System Driven by In-Parallel Linear Motors, Annals of the CIRP, Vol.45, No.1(1996), pp.359-362. (Pubitemid 126601466)
    • (1996) CIRP Annals - Manufacturing Technology , vol.45 , Issue.1 , pp. 359-362
    • Tomita, Y.1    Makino, K.2    Sugimine, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.