Poly(2-vinylnaphthalene)-block-poly(acrylic acid) block copolymer: Self-assembled pattern formation, alignment, and transfer into silicon via plasma etching

Macromolecular Chemistry and Physics

Volumn 212, Issue 16, 2011, Pages 1735-1741

  Zhang, Xin ^a   Metting, Christopher J ^a   Briber, Robert M ^a   Weilnboeck, Florian ^a   Shin, Sang Hak ^a   Jones, Benjamin G ^a   Oehrlein, Gottlieb S ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

block copolymers; poly(2 vinylnaphthalene) block poly(acrylic acid); reactive ion etching; self assembly; solvent vapor exposure

Indexed keywords

ACETONE VAPORS; ACRYLIC ACIDS; DIBLOCK COPOLYMER; ELECTRIC FIELD STRENGTH; ETCHING SELECTIVITY; FASTER RATES; LAMELLAR MORPHOLOGY; NANOSCALE PATTERNING; POLY(2-VINYLNAPHTHALENE)-BLOCK-POLY(ACRYLIC ACID); POLYMER SYSTEMS; SELF-ASSEMBLED; SELF-ASSEMBLED PATTERNS; SOLVENT VAPOR EXPOSURE; SPIN CAST;

ACETONE; BLOCK COPOLYMERS; CARBOXYLIC ACIDS; COPOLYMERIZATION; ELECTRIC FIELDS; LITHOGRAPHY; PLASMA ETCHING; SULFUR HEXAFLUORIDE; VAPORS;

DRY ETCHING;

EID: 80051605995     PISSN: 10221352     EISSN: 15213935     Source Type: Journal    
DOI: 10.1002/macp.201100232     Document Type: Article

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