Study on PECVD SiO2/Si3N4 double-layer electrets with different thicknesses

Science China Technological Sciences

Volumn 54, Issue 8, 2011, Pages 2123-2129

  Zou, Xudong ^a   Zhang, Jinwen ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

electrets; PECVD; thicknesses

Indexed keywords

ELECTRETS; GLASS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON OXIDES; STABILITY; SUBSTRATES; SURFACE POTENTIAL; THERMOOXIDATION;

CHARGE STABILITY; CHARGING CONDITIONS; GLASS SUBSTRATES; HIGH-HUMIDITY ENVIRONMENT; PYREX 7740 GLASS; SILICON SUBSTRATES; THERMAL OXIDATION; THICKNESSES;

SILICON;

EID: 80051601022     PISSN: 16747321     EISSN: 18691900     Source Type: Journal    
DOI: 10.1007/s11431-011-4423-z     Document Type: Article

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