Comparison of hydrophilic properties of TiO2 thin films prepared by sol-gel method and reactive magnetron sputtering system

Thin Solid Films

Volumn 519, Issue 20, 2011, Pages 6944-6950

  Nam, S H ^a   Cho, S J ^a   Jung, C K ^a   Boo, J H ^a   Sicha J ^b   Herman D ^b   Musil, J ^b   Vlcek J ^b  

^a Sungkyunkwan University   (South Korea)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Oxygen plasma treatment; Photocatalytic property; Reactive magnetron sputtering; Sol gel; TiO2 films

Indexed keywords

AFM; AS-DEPOSITED FILMS; AS-DEPOSITED STATE; BIPOLAR PULSED POWER; DUAL MAGNETRONS; FILM SURFACES; GLASS SUBSTRATES; HIGH RESOLUTION; HYDROPHILIC PROPERTIES; OXYGEN PLASMA TREATMENTS; PHOTOCATALYTIC PROPERTY; REACTIVE MAGNETRON SPUTTERING; SIGNIFICANT DETERIORATIONS; SOL-GEL TIO; TIO; TITANIUM ISOPROPOXIDE; UV IRRADIATION; WATER CONTACT ANGLE; XPS MEASUREMENTS;

CONTACT ANGLE; DC POWER TRANSMISSION; DETERIORATION; ELECTRIC DISCHARGES; GELS; HYDROPHILICITY; MAGNETRON SPUTTERING; OXYGEN; PLASMA APPLICATIONS; PULSE GENERATORS; SOL-GEL PROCESS; SOL-GELS; SOLS; SUBSTRATES; TITANIUM; TITANIUM DIOXIDE;

FILM PREPARATION;

EID: 80051552695     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.144     Document Type: Conference Paper

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