Effect of temperature on the decomposition of trifluoromethane in a dielectric barrier discharge reactor

Thin Solid Films

Volumn 519, Issue 20, 2011, Pages 6960-6963

  Kim, D H ^a   Mok, Y S ^a   Lee, S B ^a  

^a Jeju National University   (South Korea)

Author keywords

Dielectric barrier discharge; Nonthermal plasma; Semiconductor processing gas; Ttrifluoromethane

Indexed keywords

ALUMINA BEADS; ALUMINA CATALYSTS; DECOMPOSITION EFFICIENCY; DECOMPOSITION OF TRIFLUOROMETHANE; DIELECTRIC BARRIER DISCHARGE REACTORS; DIELECTRIC BARRIER DISCHARGES; EFFECT OF TEMPERATURE; ELEVATED TEMPERATURE; GLASS BEAD; HIGHER TEMPERATURES; NONTHERMAL PLASMA; PACKING MATERIALS; REACTOR TEMPERATURES; SEMICONDUCTOR PROCESSING; TTRIFLUOROMETHANE;

CARBON DIOXIDE; CATALYSTS; EFFICIENCY; ELECTRIC DISCHARGES; FLOW CONTROL; GLASS; GRANULAR MATERIALS; TEMPERATURE;

DIELECTRIC DEVICES;

EID: 80051547755     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.11.060     Document Type: Conference Paper

References (15)

1. W.-T. Tsai, H.-P. Chen, and W.-Y. Hsien J. Loss Prev. Process Ind. 15 2002 65
2. K. Takaki, K. Urashima, and J.S. Chang Thin Solid Films 506-507 2006 414
3. T. Fujita, T. Kawano, L. Huang, Y. Kojima, H. Matsuda, and K. Ushiroebisu J. Mater. Cycles Waste Manage. 9 2007 15
4. K. Urashima, K.G. Kostov, J.S. Chang, Y. Okayasu, T. Iwaizumi, K. Yoshimura, and T. Kato IEEE Trans. Ind. Appl. 37 2001 1456
5. K. Takaki, K. Urashima, and J.S. Chang IEEE Trans. Plasma Sci. 32 2004 2175
6. J.L. Delattre, T.L. Friedman, and A.M. Stacy J. Vac. Sci. Technol. B 17 1999 2664
7. S.J. Yu, and M.B. Change Plasma Chem. Plasma Process. 21 2001 311
8. H.-H. Kim, S.-M. Oh, A. Ogata, and S. Futamura Appl. Catal. B Environ. 56 2005 213
9. T. Blackbeard, V. Demidyuk, S.L. Hill, and J.C. Whitehead Plasma Chem. Plasma Process. 29 2009 411
10. V. Demidyuk, and J.C. Whitehead Plasma Chem. Plasma Process. 27 2007 85
11. L.A. Rosocha IEEE Trans. Plasma Sci. 33 2005 129
12. D.H. Kim, Y.S. Mok, S.B. Lee, and S.M. Shin J. Adv. Oxid. Technol. 13 2010 36
13. W.G. Mallard, F. Westley, J.T. Herron, R.F. Hampson, and D.H. Frizzell Chemical Kinetics Database (Version 2Q98) 1998 National Institute of Standards and Technology (NIST) USA
14. J.R. Barker Progress and Problems in Atmospheric Chemistry 1995 World Scientific London
15. C.L. Ricketts, A.E. Wallis, J.C. Whitehead, and K. Zhang J. Phys. Chem. A 108 2004 8341