Electrical and optical properties of NiO films deposited by magnetron sputtering

Optica Applicata

Volumn 41, Issue 2, 2011, Pages 431-440

  Guziewicz, Marek ^a   Grochowski, Jakub ^a,b   Borysiewicz, Michal ^a   Kaminska, Eliana ^a   Domagala, Jaroslaw Z ^a,c   Rzodkiewicz, Witold ^a   Witkowski, Bartlomiej S ^c   Golaszewska, Krystyna ^a   Kruszka, Renata ^a   Ekielski, Marek ^a   Piotrowska, Anna ^a  

^a Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c INSTITUTE OF PHYSICS   (Poland)

Author keywords

NiO; Optical transmittance; P type semiconductor; Transparent conductive oxide

Indexed keywords

AS-DEPOSITED FILMS; DEPOSITION TEMPERATURES; ELECTRICAL AND OPTICAL PROPERTIES; HIGH POTENTIAL; NIO; NIO FILMS; OPTICAL PARAMETER; P-TYPE CONDUCTIVITY; P-TYPE SEMICONDUCTOR; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; TEMPERATURE RANGE; TRANSMITTANCE MEASUREMENTS; TRANSPARENT CONDUCTIVE OXIDES; TRANSPARENT SEMICONDUCTOR; VISIBLE RANGE;

ARGON; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN;

OPTICAL FILMS;

EID: 79961066608     PISSN: 00785466     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (16)

1. LEI AI, GUOJIA FANG, LONGYAN YUAN, NISHUANG LIU, MINGJUN WANG, CHUN LI, QILIN ZHANG, JUN LI, XINGZHONG ZHAO, Influence of substrate temperature on electrical and optical properties of p-type semitransparent conductive nickel oxide thin films deposited by radio frequency sputtering, Applied Surface Science 254(8), 2008, pp. 2401-2405. (Pubitemid 351187817)
2. HOTOVÝ I., HURAN J., JANÍK J., KOBZEV A.P., Deposition and properties of nikel oxide films produced by DC reactive magnetron sputtering, Vacuum 51(2), 1998, pp. 157-160. (Pubitemid 128409661)
3. AZENS A., KULLMAN L., VAIVARS G., NORDBORG H., GRANQVIST C.G., Sputter-deposited nikel oxide for electrochromic applications, Solid State Ionics 113-115, 1998, pp. 449-456. (Pubitemid 128420479)
4. SHIN W., MURAYAMA N., High performance p-type thermoelectric oxide based on NiO, Materials Letters 45(6), 2000, pp. 302-306.
5. HOTOVÝ I., HURAN J., SPIESS L., ČAPKOVIC R., HAŠÍK S., Preparation and characterization of NiO thin films for gas sensor applications, Vacuum 58(2-3), 2000, pp. 300-307.
6. LEONG-M. CHOI, SEONGIL IM, Ultrafiolet enhanced Si-photodetector using p-NiO films, Applied Surface Science 244(1-4), 2005, pp. 435-438. (Pubitemid 40423749)
7. OHTA H., KAMIYA M., KAMIYA T., HIRANO M., HOSONO H., UV-detector based on pn-heterojunction diode composed of transparent oxide semiconductors, p-NiO/n-ZnO, Thin Solid Films 445(2), 2003, pp. 317-321.
8. RYU H.Y., CHOI G.P., LEE W.S., PARK J.S., Preferred orientations of NiO thin films prepared by RF magnetron sputtering, Journal of Materials Science 39(13), 2004, pp. 4375-4377.
9. SASI B., GOPCHANDRAN K.G., MANOJ P.K., KOSHY P., PRABHAKARA RAO P., VAIDYAN V.K., Preparation of transparent and semiconducting NiO films, Vacuum 68(2), 2002, pp. 149-154. (Pubitemid 35167590)
10. AGRAWAL A., HABIBI H.R., AGRAWAL R.K., CRONIN J.P., ROBERTS D.M., CARON-POPOWICH R., LAMPERT C.M., Effect of deposition pressure on the microstructure and electrochromic properties of electron-beam-evaporated nickel oxide films, Thin Solid Films 221(1-2), 1992, pp. 239-253. (Pubitemid 23614386)
11. KOROSEC R.C., BUKOVEC P., Sol-gel prepared NiO thin films for electrochromic applications, Acta Chimica Slovenica 53(2), 2006, pp. 136-147. (Pubitemid 44060511)
12. TANAKA M., MUKAI M., FUJIMORI Y., KONDOH M., TASAKA Y., BABA H., USAMI S., Transition metal oxide films prepared by pulsed laser deposition for atomic beam detection, Thin Solid Films 281-282, 1996, pp. 453-456. (Pubitemid 126388140)
13. YING ZHOU, DONGHONG GU, YONGYOU GENG, FUXI GAN, Thermal, structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering, Materials Science and Engineering B 135(2), 2006, pp. 125-128. (Pubitemid 44646820)
14. WEI-LUEN JANG, YANG-MING LU, WENG-SING HWANG, TUNG-LI HSIUNG, WANG H.P., Effect of substrate temperature on the electrically conductive stability of sputtered NiO films, Surface and Coatings Technology 202(22-23), 2008, pp. 5444-5447.
15. HAKIM A., HOSSAIN J., KHAN K.A., Temperature effect on the electrical properties of undoped NiO thin films, Renewable Energy 34(12), 2009, pp. 2625-2629.
16. CHEUNG S.K., CHEUNG N.W., Extraction of Schottky diode parameters from forward current-voltage characteristics, Applied Physics Letters 49(2), 1986, pp. 85-87.