X-ray laser-induced ablation of lead compounds

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8077, Issue , 2011, Pages

  Hajkova V ^a   Juha, L ^a   Bohacek P ^a   Burian, T ^a   Chalupsky J ^a   Vysin L ^a   Gaudin, J ^b   Heimann, P A ^c   Hau Riege, S P ^d   Jurek, M ^e   Klinger, D ^e   Pelka, J ^e   Sobierajski, R ^e   Krzywinski, J ^f   Messerschmidt, M ^f   Moeller, S P ^f   Nagler, B ^f   Rowen, M ^f   Schlotter, W F ^f   Swiggers, M L ^f   Turner, J J ^f   Vinko, S M ^g   Whitcher, T ^g   Wark, J ^g   Matuchova M ^h   Bajt, S ⁱ   Chapman, H ⁱ   Dzelzainis, T ^j   Riley, D ^j   Andreasson, J ^k   Hajdu, J ^k   Iwan, B ^k   Timneanu, N ^k   Saksl, K ^l   Faustlin R ^m   Singer, A ^m   Tiedtke, K ^m   Toleikis, S ^m   Vartaniants, I ^m   Wabnitz, H ^m   more..

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b EUROPEAN XFEL GMBH   (Germany)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^e INSTITUTE OF PHYSICS   (Poland)

^f SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^g UNIVERSITY OF OXFORD   (United Kingdom)

^h INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

ⁱ Center for Free Electron Laser Science   (Germany)

^j QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^k UPPSALA UNIVERSITY   (Sweden)

^l INSTITUTE OF MATERIALS RESEARCH   (Slovakia)

^m DESY   (Germany)

more..

Author keywords

Damage thresholds; Extreme ultraviolet laser; Focused beam characterization; Free electron laser; Laser ablation; Radiation damage; Single shot damage; X ray laser

Indexed keywords

13.5 NM; ABLATION PROCESS; ABLATION THRESHOLDS; ATTENUATION LENGTHS; DAMAGE THRESHOLD; EFFECTIVE ATTENUATION LENGTH; EXTREME ULTRAVIOLET LASER; EXTREME ULTRAVIOLET RADIATIONS; FOCUSED BEAMS; HIGH-DENSITY MATERIALS; LASER-INDUCED ABLATION; LEAD IODIDE; LEAD TUNGSTATE; RADIATION STABILITY; SINGLE-SHOT; SPECTRAL REGION; WAVELENGTH DEPENDENCE; X-RAY ABLATION; X-RAY FREE ELECTRON LASERS;

CHARACTERIZATION; FREE ELECTRON LASERS; LASER ABLATION; LEAD COMPOUNDS; OPTICS; RADIATION DAMAGE; TUNGSTEN COMPOUNDS; ULTRAVIOLET LASERS; ULTRAVIOLET RADIATION; X RAY LASERS; X RAYS;

ABLATION;

EID: 79960547331     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.890134     Document Type: Conference Paper

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