Soft x-ray free electron laser microfocus for exploring matter under extreme conditions

Optics Express

Volumn 17, Issue 20, 2009, Pages 18271-18278

  Nelson, A J ^a   Toleikis, S ^b   Chapman, H ^b   Bajt, S ^c   Krzywinski, J ^d   Chalupsky, J ^e,f   Juha, L ^e   Cihelka, J ^e,g   Hajkova, V ^e   Vysin, L ^e,f   Burian, T ^e,f   Kozlova, M ^e   Faustlin R R ^c   Nagler, B ^h   Vinko, S M ^h   Whitcher, T ^h   Dzelzainis, T ⁱ   Renner, O ^e   Saksl, K ^j   Khorsand, A R ^k   Heimann, P A ^l   Sobierajski, R ^m   Klinger, D ^m   Jurek, M ^m   Pelka, J ^m   Iwan, B ⁿ   Andreasson, J ⁿ   Timneanu, N ⁿ   Fajardo, M ^o   Wark, J S ^h   Riley, D ⁱ   Tschentscher, T ^c   Hajdu, J ⁿ   Lee, R W ^a   more..

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF HAMBURG   (Germany)

^c DESY   (Germany)

^d SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^e INSTITUTE OF PHYSICS   (Czech Republic)

^f CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^g J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^h UNIVERSITY OF OXFORD   (United Kingdom)

ⁱ QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^j INSTITUTE OF MATERIALS RESEARCH   (Slovakia)

^k FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^l LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^m INSTITUTE OF PHYSICS   (Poland)

ⁿ UPPSALA UNIVERSITY   (Sweden)

^o INSTITUTO SUPERIOR TÉCNICO   (Portugal)

more..

Author keywords

[No Author keywords available]

Indexed keywords

ESTERS; FREE ELECTRON LASERS; MULTILAYERS;

EXTREME CONDITIONS; FOCAL LENGTHS; FOCUSED BEAMS; ISOCHORIC HEATING; MO/SI MULTILAYER; POLY(METHYL METHACRYLATE) (PMMA); PULSE ENERGIES; SOFT-X-RAY FREE-ELECTRON-LASER;

ELECTRONS;

ARTICLE; COMPUTER AIDED DESIGN; ELECTRON; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; LASER; MATERIALS TESTING; METHODOLOGY; OPTICAL INSTRUMENTATION; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; X RAY DIFFRACTION;

COMPUTER-AIDED DESIGN; ELECTRONS; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LASERS; LENSES; MATERIALS TESTING; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; X-RAY DIFFRACTION;

EID: 70349680899     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.018271     Document Type: Article

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