Homogeneous nano-patterning using plasmon-assisted photolithography

Applied Physics Letters

Volumn 99, Issue 1, 2011, Pages

  Ueno, Kosei ^a,b   Takabatake, Satoaki ^a   Onishi, Ko ^a   Itoh, Hiroko ^a   Nishijima, Yoshiaki ^a   Misawa, Hiroaki ^b  

^a HOKKAIDO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HIGHER ORDER; KEY TECHNOLOGIES; LITHOGRAPHY SYSTEMS; LOCALIZED SURFACE PLASMON RESONANCE; METALLIC NANOSTRUCTURE; NANO SCALE; NANODOT PATTERNS; NANOPATTERNING; NEAR-FIELD; PHOTORESIST FILM; PLASMONIC; RADIATION MODE; TWO PHOTON;

NANOSTRUCTURED MATERIALS; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; SURFACE PLASMON RESONANCE;

PLASMONS;

EID: 79960525059     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3606505     Document Type: Article

References (11)

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