Development of photomask linewidth measurement and calibration using AFM and SEM in NMIJ

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8036, Issue , 2011, Pages

  Sugawara, Kentaro ^a   Sato, Osamu ^a   Misumi, Ichiko ^a   Gonda, Satoshi ^a   Lu, Mingzi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

AFM; Linewidth; Nanometrology; SEM; Uncertainty

Indexed keywords

AFM; AFM TIP; ATOMIC FORCE MICROSCOPES; CHROMIUM FILM; EDGE ANGLE; EDGE POSITION; FILM SURFACES; GLASS SUBSTRATES; HIGH QUALITY; LINE STRUCTURES; LINEWIDTH MEASUREMENTS; MEASUREMENT METHODS; NANOMETROLOGY; SCANNING ELECTRON MICROSCOPES; SHARP EDGES; SIDE WALLS; SURFACE PROFILES; TIP SHAPE; UNCERTAINTY;

ATOMIC FORCE MICROSCOPY; CALIBRATION; CHROMIUM; LINEWIDTH; SCANNING; SCANNING ELECTRON MICROSCOPY; SECURITY SYSTEMS; SUBSTRATES; UNCERTAINTY ANALYSIS;

PHOTOMASKS;

EID: 79960388643     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.883851     Document Type: Conference Paper

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11. To be presented at an international conference ISMTII2011.