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Journal of Materials Chemistry

Volumn 21, Issue 29, 2011, Pages 10738-10743

Influence of residual stress on magnetoelectric coupling of bilayered CoFe2O4/PMN-PT thin films

(5) Feng, Ming a,b Wang, Wen a Zhou, Yu a Li, Haibo b Jia, Dechang a

a HARBIN INSTITUTE OF TECHNOLOGY (China)

b JILIN NORMAL UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

COUPLING COEFFICIENT; COUPLING MECHANISM; GRAZING INCIDENCE X-RAY DIFFRACTION; MAGNETOELECTRIC COUPLINGS; MULTIFERROICS; PREFERRED ORIENTATIONS; SOL-GEL TECHNIQUE; STRESS-INDUCED; X RAY DIFFRACTOMETERS; XRD;

DIFFRACTION; LEAD; RESIDUAL STRESSES; THIN FILMS; X RAY DIFFRACTION;

FERROELECTRIC FILMS;

EID: 79960351605 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c1jm11271f Document Type: Article

Times cited : (14)

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