Aqueous, room temperature electrochemical deposition of compact Si films

Electrochemical and Solid-State Letters

Volumn 14, Issue 9, 2011, Pages

  Krishnamurthy, Aarti ^a   Rasmussen, Don H ^a   Suni, Ian I ^a  

^a Clarkson University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

6061 AL ALLOY; AS-DEPOSITED FILMS; ELECTROCHEMICAL DEPOSITION; ROOM TEMPERATURE; ROOM TEMPERATURE DEPOSITION; SI FILMS;

ATOMS; COPPER; DEPOSITION; FORMIC ACID; HYDROFLUORIC ACID; REDUCTION; SILICON; SODIUM;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 79960252434     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3605307     Document Type: Article

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