Galvanic deposition of nanoporous Si onto 6061 Al alloy from aqueous HF

Journal of the Electrochemical Society

Volumn 158, Issue 2, 2011, Pages

  Krishnamurthy, Aarti ^a   Rasmussen, Don H ^a,b   Suni, Ian I ^a,b  

^a CLARKSON UNIVERSITY   (United States)

^b Clarkson University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

6061 AL ALLOY; AS-DEPOSITED FILMS; ELECTROCHEMICAL DEPOSITION; ELEMENTAL ANALYSIS; ENERGY DISPERSIVE X RAY SPECTROSCOPY; GALVANIC DEPOSITION; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; MOLTEN SALT ELECTROLYTES; NANO-POROUS; OVERALL REACTIONS; SI FILMS;

ALUMINUM; ATOMIC SPECTROSCOPY; ATOMS; COPPER; DEPOSITION; DISSOLUTION; FUSED SALTS; HIGH RESOLUTION ELECTRON MICROSCOPY; HYDROFLUORIC ACID; ORGANIC SOLVENTS; REDUCTION; SCANNING ELECTRON MICROSCOPY; SILICON; X RAY SPECTROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 78650727600     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3521290     Document Type: Article

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