Nano/micro-structuring of oxide thin film under SHI irradiation

Vacuum

Volumn 86, Issue 1, 2011, Pages 96-100

  Chauhan, R S ^a   Agarwal, D C ^a,b   Kumar, S ^c   Khan, S A ^b   Kabiraj, D ^b   Sulania, I ^b   Avasthi, D K ^b   Bolse, W ^d  

^a R B S COLLEGE   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^c MANAV RACHNA INTERNATIONAL INSTITUTE OF RESEARCH AND STUDIES   (India)

^d UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Atomic force microscopy; Ion irradiation; Nano patterning; Oxide thin film

Indexed keywords

AFM IMAGE; AL SUBSTRATE; ALMOST PERIODIC; AVERAGE DISTANCE; BEAM AXIS; BEAM DIRECTION; DIFFERENT SUBSTRATES; FLUENCES; INCIDENCE ANGLES; IRRADIATED SAMPLES; IRRADIATED SURFACE; NANOPATTERNING; NIO FILMS; NIO THIN FILM; OXIDE THIN FILM; OXIDE THIN FILMS; SECTION ANALYSIS; SHI IRRADIATION;

ALUMINUM; ATOMIC FORCE MICROSCOPY; IONS; IRRADIATION; OXIDE FILMS; SILICON COMPOUNDS; SILVER; SURFACE MORPHOLOGY; THIN FILMS;

SUBSTRATES;

EID: 79960183874     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.04.024     Document Type: Article

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