Influence of grain size on electronic sputtering of LiF thin films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 256, Issue 1, 2007, Pages 328-332

  Kumar, M ^a   Khan, S A ^b   Singh, F ^b   Tripathi, A ^b   Avasthi, D K ^b   Pandey, A C ^a  

^a UNIVERSITY OF ALLAHABAD   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

Electronic sputtering; ERDA; LiF; Nanometric films; Swift heavy ions

Indexed keywords

GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HEAVY IONS; IONS; POLYCRYSTALLINE MATERIALS; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

ELECTRONIC SPUTTERING; LITHIUM FLUORIDE FILMS; NANOMETRIC FILMS; SPUTTER YIELD; SWIFT HEAVY IONS;

LITHIUM COMPOUNDS;

EID: 33947150893     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.12.021     Document Type: Article

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