|
Volumn 21, Issue 28, 2011, Pages 10407-10414
|
Reworkable dimethacrylates with low shrinkage and their application to UV nanoimprint lithography
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CHAIN TRANSFER;
DIMETHACRYLATES;
HEMIACETAL ESTER;
LIGHT INTENSITY;
LINEAR POLYMERS;
LOW SHRINKAGE;
MONOMER STRUCTURES;
PHOTORADICAL INITIATORS;
UV CURED;
UV IMPRINT;
UV NANOIMPRINT LITHOGRAPHY;
UV-CURING;
CHAIN LENGTH;
CURING;
DEGRADATION;
GEL PERMEATION CHROMATOGRAPHY;
MONOMERS;
SHRINKAGE;
SIZE EXCLUSION CHROMATOGRAPHY;
NANOIMPRINT LITHOGRAPHY;
|
EID: 79960180728
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c0jm04386a Document Type: Article |
Times cited : (22)
|
References (21)
|