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Volumn 21, Issue 28, 2011, Pages 10407-10414

Reworkable dimethacrylates with low shrinkage and their application to UV nanoimprint lithography

Author keywords

[No Author keywords available]

Indexed keywords

CHAIN TRANSFER; DIMETHACRYLATES; HEMIACETAL ESTER; LIGHT INTENSITY; LINEAR POLYMERS; LOW SHRINKAGE; MONOMER STRUCTURES; PHOTORADICAL INITIATORS; UV CURED; UV IMPRINT; UV NANOIMPRINT LITHOGRAPHY; UV-CURING;

EID: 79960180728     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c0jm04386a     Document Type: Article
Times cited : (22)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.