Thermal evaporation furnace with improved configuration for growing nanostructured inorganic materials

Review of Scientific Instruments

Volumn 82, Issue 6, 2011, Pages

  Joanni, E ^a   Savu, R ^b,c   Valadares, L ^c   Cilense, M ^b   Zaghete, M A ^b  

^a Centro de Tecnologia da Informacao Renato Archer   (Brazil)

^b SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^c UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CONDITIONS; DIFFERENT MASS; ENHANCED SENSITIVITY; EVAPORATION TEMPERATURE; GOLD CATALYSTS; GRAPHITE POWDER; INDIUM OXIDE; INDIUM OXIDE NANOWIRES; INORGANIC MATERIALS; NANO-STRUCTURED; NANO-STRUCTURED LAYER; OXIDIZED SILICON SUBSTRATES; OXYGEN PARTIAL PRESSURE; RECOVERY TIME; SEMICONDUCTING OXIDE; SUBSTRATE TEMPERATURE; TEMPERATURE RANGE; TOTAL PRESSURE; TUBULAR FURNACES; VOLUMETRIC FLOW;

GOLD COATINGS; GOLD DEPOSITS; INDIUM; NANOWIRES; OXYGEN; PHASE TRANSITIONS; SILICON OXIDES; SUBSTRATES; SYNTHESIS (CHEMICAL);

THERMAL EVAPORATION;

EID: 79960155718     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3597577     Document Type: Article

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