Ellipsometric study of carbon nitride films deposited by DC-magnetron sputtering

Photonics Letters of Poland

Volumn 3, Issue 2, 2011, Pages 70-72

  Majumdar, A ^a   Bogdanowicz, R ^a,b   Hippler, R ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b GDANSK UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NITRIDE FILMS; DC MAGNETRON SPUTTERING; DEPOSITED FILMS; DEPOSITION CONDITIONS; ELLIPSOMETRIC ANALYSIS; EXTINCTION COEFFICIENTS; IMAGINARY PARTS; NITROGEN CONCENTRATIONS; PHOTON ENERGY RANGE; REFRACTION INDEX; REFRACTIVE INDEX AND BAND GAP;

CARBON FILMS; ENERGY GAP; LIGHT REFRACTION; NITROGEN; REFRACTIVE INDEX; REFRACTOMETERS; SPECTROSCOPIC ELLIPSOMETRY;

CARBON NITRIDE;

EID: 79960145255     PISSN: None     EISSN: 20802242     Source Type: Journal    
DOI: 10.4302/plp.2011.2.09     Document Type: Article

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