Large area nanopatterning by combined anodic aluminum oxide and soft UV-NIL technologies for applications in biology

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2444-2446

  Hamouda, Frédéric ^a   Sahaf, Houda ^b   Held, Sylvain ^a   Barbillon, Grégory ^c   Gogol, Philippe ^a   Moyen, Eric ^b   Aassime, Abdelhanin ^a   Moreau, Julien ^c   Canva, Michael ^c   Lourtioz, Jean Michel ^a   Hanbücken, Margrit ^b   Bartenlian, Bernard ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b AIX MARSEILLE UNIVERSITÉ   (France)

^c UNIV PARIS SUD   (France)

Author keywords

Hexane; Nanoporous alumina; PDMS stamp; Soft UV NIL; Viscosity

Indexed keywords

AAO TEMPLATE; ANODIC ALUMINUM OXIDE; NANO-POROUS; NANO-STRUCTURED; NANOPATTERNING; NANOPOROUS ALUMINA; NANOSTRUCTURED SILICON; PDMS STAMP; REDUCED VISCOSITY; SOFT LITHOGRAPHY; SOFT UV-NIL; UV-ASSISTED NANOIMPRINT LITHOGRAPHY; VISCOSITY EVOLUTION;

ALUMINUM; BIOLOGY; HEXANE; MICROCHANNELS; MOLDS; NANOIMPRINT LITHOGRAPHY; OXIDES; VISCOSITY;

ANODIC OXIDATION;

EID: 79960059129     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.013     Document Type: Conference Paper

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