Roller nanoimprint lithography for flexible electronic devices of a sub-micron scale

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2017-2020

  Lim, Hyungjun ^a   Choi, Kee Bong ^a   Kim, Geehong ^a   Park, Sooyeon ^b   Ryu, Jihyeong ^b   Lee, Jaejong ^a,b  

^a Korea Institute of Machine and Materials   (South Korea)

^b University of Science and Technology (UST)   (South Korea)

Author keywords

Flexible substrate; Nanoimprint lithography (NIL); Roller nanoimprint lithography (RNIL)

Indexed keywords

CIRCULAR SHAPE; CONTACT FORCES; CONTACT LINES; FLEXIBLE ELECTRONIC DEVICES; FLEXIBLE SUBSTRATE; NANO-IMPRINT; NANO-SCALE PATTERNS; NANOIMPRINT LITHOGRAPHY (NIL); PRESS ROLLERS; SEM IMAGE; SI WAFER; SUBMICRON SCALE;

ROLLERS (MACHINE COMPONENTS); SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 79960040447     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.018     Document Type: Conference Paper

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