Fabrication of a 3D stamp with the micro- and nano-scale patterns through combined NIL and optical lithography processes

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 968-971

  Park, Sooyeon ^a,b   Kim, Geehong ^b   Choi, Keebong ^b   Lee, Jaejong ^a,b  

^a University of Science and Technology (UST)   (South Korea)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

Micro and nano patterning; Nonoimprint lithography; Optical lithography; Stamp replication

Indexed keywords

ALL-AT-ONCE; FABRICATION PROCESS; FUNCTIONAL STRUCTURE; LARGE AREA STAMP; LARGE-AREA PATTERNING; MICRO- AND NANO- PATTERNING; NANO-SCALE PATTERNS; OPTICAL LITHOGRAPHY; SI SUBSTRATES; THREE-DIMENSIONAL STRUCTURE;

FABRICATION; NANOSTRUCTURED MATERIALS; PHOTOLITHOGRAPHY; SILICON WAFERS; THREE DIMENSIONAL;

NANOIMPRINT LITHOGRAPHY;

EID: 76949101934     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.132     Document Type: Article

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