An ultrahigh vacuum complementary metal oxide silicon compatible nonlithographic system to fabricate nanoparticle-based devices

Review of Scientific Instruments

Volumn 79, Issue 3, 2008, Pages

  Banerjee, Arghya ^a   Das, Biswajit ^a  

^a University of Nevada Las Vegas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LEVELS; LITHOGRAPHY; PHOTONIC DEVICES; SEMICONDUCTOR MATERIALS; SILICON; VACUUM APPLICATIONS;

ELECTRONIC DEVICES; NONLITHOGRAPHIC SYSTEMS; VOLUME MANUFACTURING;

NANOPARTICLES;

EID: 41549165686     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2885042     Document Type: Article

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