Chemical composition of SiOx films deposited by an atmospheric pressure plasma jet (APPJ)

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Schäfer, Jan ^a   Foest, Rüdiger ^a   Ouade, Antje ^a   Ohl, Andreas ^a   Weltmann, Klaus Dieter ^a  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

Author keywords

APPJ; ATR FT IR; Deposition phase diagram; OMCTS; PE CVD

Indexed keywords

ABSORBANCES; ATMOSPHERIC PRESSURE PLASMA JETS; ATR FTIR; CHEMICAL COMPOSITIONS; DEPOSITION CONDITIONS; DEPOSITION PHASE; DEPOSITION PROFILES; EXPERIMENTAL STUDIES; FILM QUALITY; IR ABSORPTION; IR BANDS; ORGANOSILICON FILMS; RADIAL GRADIENT; STRUCTURAL PHASIS; XPS;

ATMOSPHERIC PRESSURE; PHASE DIAGRAMS; SILICON COMPOUNDS;

CHEMICAL VAPOR DEPOSITION;

EID: 77954922956     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931103     Document Type: Conference Paper

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