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Applied Physics Letters

Volumn 98, Issue 19, 2011, Pages

Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering

(5) Lee, Yun Seog a Winkler, Mark T a Siah, Sin Cheng a Brandt, Riley a Buonassisi, Tonio a

a MASSACHUSETTS INSTITUTE OF TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER SCATTERING; CUPROUS OXIDE; DIRECT-CURRENT MAGNETRON SPUTTERING; FILM GRAIN; MONOCRYSTALLINE; PHOTOVOLTAIC APPLICATIONS; POLYCRYSTALLINE; REACTIVE DC MAGNETRON SPUTTERING; ROOM TEMPERATURE; TEMPERATURE DEPENDENT;

CARRIER MOBILITY; COPPER; FILM GROWTH; GRAIN GROWTH; GROWTH TEMPERATURE; HALL MOBILITY; OXIDE FILMS; PHOTOVOLTAIC EFFECTS; THIN FILMS;

GALVANOMAGNETIC EFFECTS;

EID: 79959659085 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3589810 Document Type: Article

Times cited : (136)

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